2023.10.05 17:34

IMID 2023, Pusan, Korea

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IMID 2023, Pusan, Korea

August 22 - August 25, 2023 (Tue. - Fri.), Bexco


KakaoTalk_20230915_133716109.jpg


Ultra-High Resolution Organic Light-Emitting Diodes Combined with Plasmonic Nanomesh Electrodes

Ryungyu Lee, Keun-Yeong Choi, and Hojin Lee


Abstract


 Organic light-emitting diodes (OLEDs) have led to the rapid growth of the next-generation display technology due to high luminance efficiency, vivid color, and high contrast ratio, thereby expanding their applications from conventional mobile or TV displays to hyper-realistic microdisplay such as virtual reality (VR)/ augmented reality (AR) displays. Particularly, research have done combined plasmonic nanotechnology and organic light-emitting devices are being actively studied to improve optical and electrical properties. In this work, we propose a high resolution OLEDs based on a double resonance structure combined with an asymmetric Fabry-Perot (FP) etalon structure and a plasmonic nanomesh electrodes (PNE) using a photo- patternable organic light-emitting semiconductor without deterioration of intrinsic physical/photoelectric properties of OLEDs.

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2022.11.11 20:37

IMID 2022, Pusan, Korea

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IMID 2022, Pusan, Korea

August 23 - August 26, 2022 (Tue. - Fri.), Bexco


KakaoTalk_20221111_165547216_08.jpg


Ultra-High Resolution Organic Light-Emitting Diodes Based on Plasmonic Patterned Nanograting Array

Ryungyu Lee, Keun-Yeong Choi, and Hojin Lee


Abstract

  

Organic light-emitting diodes (OLEDs) have led to the rapid growth of the next-generation display technology due to high luminance efficiency, vivid color, and high contrast ratio, thereby expanding their applications from conventional mobile or TV displays to virtual reality (VR)/ augmented reality (AR) displays. For more effective light extraction, implementing nanostructures onto metal electrode layer of OLEDs as a future display technology has been demonstrated by use of excitation and out-coupling of the surface plasmon-polariton modes (SPPs). In this work, we propose a high resolution OLEDs based on plasmonic patterned nanograting array (PNA) that induces a plasmonic effect on OLEDs through the nano-patterned organic emission layer by applying E-beam lithography on the fabrication process without deterioration of intrinsic physical/photoelectric properties of organic layers.

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2018.06.14 11:35

2017 iMiD, Busan, Korea

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2017 iMiD, Busan, Korea

August 28 - 31, 2017 (Mon - Thur), Convention Hall, BEXCO

 

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<Poster Session>

Solution-Processed a-InGaZnO Thin Film Transistor Based Operational Amplifier for the Flexible Display Driving System

Yongchan Kim, Daejung Kim, Keun-Yeong Choi, Dayoon Lee, and Hojin Lee

 

 Abstract

 Currently, amorphous indium-gallium-zinc-oxide (a-InGaZnO) thin-film transistors (TFTs) have attracted much interest as a next-generation TFT backplane thanks to their high field-effect mobility, low leakage current, and good electrical stability. In particular, the formation of the active layer in a-InGaZnO TFTs through the solution process has been actively researched recently because of their optical transparency, flexibility and superior air stability. In this paper, we adopted a DLP (direct light patterning) process [1], and demonstrated the electrical characteristics of the TFTs and logic circuits fabricated on the glass. Through this study, we expect to realize solution-processed system-on-glass (SOG), for transparent, portable, and flexible flat panel displays.

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2024.10.30 13:53

AMSM 2024, Incheon, Korea

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AMSM 2024, Incheon, Korea

October 27 - October 30, 2024 (Sun. - Wen.), Songdo ConvensiA


KakaoTalk_20241030_132229360_16.jpg


Silicone-Integrated Photolithography for Ultra High-Resolution Organic Photodiodes in Augumented/Virtual Reality Applications


Ryungyu Lee, Keun-Yeong Choi, Hyukmin Kweon, Do Hwan Kim and Hojin Lee


Abstract


Organic photodiodes are ideal for advanced flexible electronic applications such as imaging and video photography due to their tunable photophysical properties, low-cost and simple processing methods, and continuously improving performance. In particular, the simple design and thin thickness of organic material-based devices enable the control of optical and geometrical crosstalk, garnering attention for application in image sensors. Utilizing these organic photodiodes in image sensors necessitates their integration into high-density arrays. This approach is essential for achieving the precise and effective performance required for advanced imaging applications. However, the absence of precise pixelation techniques capable of implementing organic light-emitting semiconductor with high production and reliability has limited the realization of high-density organic photodiodes. In this paper, we present a silicone engineered anisotropic lithography of the organic light-emitting semiconductor (OLES) that in-situ forms a non-volatile etch blocking layer during reactive ion etching. This unique feature not only slows the etch rate but also enhances the anisotropy of etch direction, leading to gain delicate control in forming ultrahigh-density multicolor OLES patterns (minimum line width of 2µm) through photolithography. This patterning strategy inspired by silicon etching chemistry is expected to provide new insights into high-density organic photodiodes. Furthermore, the proposed system is expected to be applicable to flexible substrates, extending its use to soft sensor applications such as artificial eyes.

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2018.09.06 12:13

2018 iMiD, Busan, Korea

조회 수 621 추천 수 0 댓글 0
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2018 iMiD, Busan, Korea

August 28 - 31, 2017 (Tue. - Fri.), Exhibition Center I, BEXCO 


 IMID-1.jpg



Tandem structured 2-color micro-polymer light-emitting diodes (μ-PLEDs)

Keun-Yeong Choi, Han Wool Park, Do Hwan Kim and Hojin Lee

 

 Abstract

Recently organic light emitting diodes (OLED) displays have been selected for commercial mobile devices, curved TVs and Virtual Reality (VR) because of their advantages such as high contrast, high response speed, and wide viewing angle. Typically, OLED pixels are fabricated using thermal evaporation and shadow mask. However, using a shadow mask creates a limitation in implementing high-resolution pixels into the display panel. In order to achieve micronsize OLED pixels, many different approaches had been reported for patterning OLED layers into micron-size such as ink-jet printing, imprinting, and adopting orthogonal photo-resisit. however, created addition problems of luminance degradation, limited panel-size, or increased production costs. Previously, we developed a sol-gel process to obtain the orthogonality of organic semiconductor against the solvents and chemicals so that we could apply the standard photo-lithography and dry-etch process to achieve micron-size patterns of light-emitting polymers[1]. Using this mechanism, we could successfully fabricated a CMOS circuits with micron-patterned n- and p-type organic semiconductors through sequential solution processes based on standard photolithograph. Through, we confirmed the feasibility of fabrication various electron device by using a sol-gel process. In this paper, we fabricated 2-color PLEDs with micropatterns of light-emitting polymer semiconductor through sequential solution processes. Fig. 1. (a) shows the optical microscopy image of patterned pixels (20 μm×20 μm) of light-emitting polymer semiconductor that were fabricated by using standard photolithography and dry-etch processes. Fig. 1. (b) shows the electroluminescence (EL) operation of 2-color PLEDs with micropatterns of lightemitting polymer semiconductor. Finally, we confirmed that the maximum luminance of the tandem structured 2- color PLEDs was 140 cd/m2 at 8V. 

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