SID Display Week 2023, Los Angeles, USA
May 22 - May 26, 2023 (Mon. - Fri.), Los Angeles Convention Center
Ultra-high
Resolution Full-Color OLEDs Patterned by Photo-Lithography Ryungyu Lee, Keun-Yeong Choi, Hyukmin Kweon, Borina Ha, Do Hwan Kim, and Hojin Lee Abstract In this paper, we
present an ultra-high resolution organic light-emitting diodes (OLEDs) pixels
patterned by conventional photo-lithography via imbuing high chemical and
physical resistance to commercial light-emitting polymers through the silicon
networked orthogonal gel process. Especially, when silicon networked orthogonal
polymers gel layers are pattered by reactive ion etch, a in-situ non-volatile
etch-blocking layer (EBL) is formed to prevent pattern distortion or damage.
This unique feature not only slows the etch rate but also enhances the
anisotropy of etch direction, leading to achieve ultra-high resolution
multicolor OPSG-based OLED patterns (up to 4,500 pixels per inch) through
photolithography. This patterning strategy is expected to provide a novel
paradigm toward ultrahigh-resolution OLED microdisplays.
